Thin film bias resistance measurement
Using a four point probe station, the arm of the machine can quickly replace the modular probe head. The probe head fixes the needle tip spacing and pressure parameters. When the probe point is on the substrate, the probe with a built-in spring will simultaneously contract all four needles. The fixed downward pressure increases the stability of the measurement. The Keithley 2400/Keysight 2900 is used for measurement. Just compare the positions of the V/I values with each other or with the previous V/I comparison, without the need to multiply by other coefficients for too complex calculations. You can choose Everbeing's software to simplify and automate the operation.
Sheet Resistance
Volume Resistance
Doping Quality
Metalization Thickness
P/N typing
V/I Measurement
Other advanced application types:
High resistance and low current
Measure RT under 200 ℃ temperature environment
Ultra high temperature RT 1200 ℃
Under anaerobic environment
Minimum spacing of 10 microns
Large area size substrate 1200mm × 900mm
Instrument combined with software
Automatic displacement measurement
Probe head specifications
Spacing: 40mil, 62.5 mil
Pressure: 80g
Material: BeCu Tungsten Carbide
High temperature option: High Temp.200 ℃